Process, geometry and stack related reliability of thick ALCU-metal-tracks

authored by: Kirsten Weide-Zaage, Verena Hein
Abstract: The downscaling in VLSI systems and the use of new materials requires the development of new test structures and in the case of harsh environment conditions the change of the test conditions to higher applied currents and test temperatures. Furthermore the application in wider operating areas and more challenging mission profiles leads to a concept of highly robust metallization stacks [1] in a metal stack system up to eight levels. These stacks can contain a thick top metallization track for high current or RF application. Looking on the metallization systems of liners and cap materials as well as the current carrying metal themselves the differences in the coefficient of thermal expansion (CTE) of the materials lead to intrinsic tension and can result in fatal delamination of the metallization. Different failure mechanisms and complicate interaction of effects in the operating area can result. The reliability of thick metal tracks is still not in focus of considerations. But the mechanical stability especially at chip corner and edge as well as local higher electromigration (EM) can be critical. With the help of finite element analysis the thermal-electrical-mechanical behavior of metallization systems and new design concepts can be investigated. Furthermore migration effects can be analyzed and a comparison of simulated and obtained behavior can be done and support reliability assessment.
Organisation(s): Institute of Microelectronic Systems
External Organisation(s): X-FAB Silicon Foundries SE
Type: Conference contribution
Pages: 1-7
No. of pages: 7
Publication date: 15.03.2018
Publication status: Published
Peer reviewed: Yes
ASJC Scopus subject areas: Electronic, Optical and Magnetic Materials, Hardware and Architecture, Electrical and Electronic Engineering, Safety, Risk, Reliability and Quality
Electronic version(s): https://doi.org/10.23919/panpacific.2018.8319008 (Access: Closed)