apl. Prof. Dr.-Ing. Dipl.-Phys. Kirsten Weide-Zaage

apl. Prof. Dr.-Ing. Dipl.-Phys. Kirsten Weide-Zaage
Adresse
Appelstr. 4
30167 Hannover
Gebäude
Raum
220
Adresse
Appelstr. 4
30167 Hannover
Gebäude
Raum
220
  • Publikationsliste

    Zeige Ergebnisse 81 - 100 von 107

    2008


    Comprehensive reliability analysis of CoWP metal Cap unit processes for high volume production in sub-μm dimensions. / Aubel, O.; Thierbach, S.; Seidel, R. et al.
    46th Annual 2008 IEEE International Reliability Physics Symposium Proceedings, IRPS. 2008. S. 675-676 4558983 (IEEE International Reliability Physics Symposium Proceedings).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Determination of migration effects in Cu-via structures with respect to process-induced stress. / Weide-Zaage, Kirsten; Zhao, Jiani; Ciptokusumo, Joharsyah et al.
    in: Microelectronics reliability, Jahrgang 48, Nr. 8-9, 08.2008, S. 1393-1397.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Simulation of migration effects in nanoscaled copper metallizations. / Weide-Zaage, Kirsten; Kashanchi, Farzan; Aubel, Oliver.
    in: Microelectronics reliability, Jahrgang 48, Nr. 8-9, 08.2008, S. 1398-1402.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Simulation of migration effects in PoP. / Weide-Zaage, Kirsten; Fremont, Helene; Wang, Linyan.
    EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems. 2008. 4525074 (EuroSimE 2008 - International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Micro-Systems).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Simulation of migration effects in solder bumps. / Weide-Zaage, Kirsten.
    in: IEEE Transactions on Device and Materials Reliability, Jahrgang 8, Nr. 3, 4595633, 09.2008, S. 442-448.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review


    2007


    Dynamic void formation in a DD-copper-structure with different metallization geometry. / Weide-Zaage, Kirsten; Dalleau, David; Danto, Yves et al.
    in: Microelectronics reliability, Jahrgang 47, Nr. 2-3, 02.2007, S. 319-325.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review


    2006


    Measurements and FE-simulations of moisture distribution in FR4 based printed circuit boards. / Frémont, Hélène; Horaud, Walter; Weide-Zaage, Kirsten.
    7th International Conference on Thermal, Mechanical and Multiphysics Simulation and Experiments in Micro-Electronics and Micro-Systems, EuroSimE 2006. 2006. 1643964 (7th International Conference on Thermal, Mechanical and Multiphysics Simulation and Experiments in Micro-Electronics and Micro-Systems, EuroSimE 2006; Band 2006).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2005


    Moisture diffusion in printed circuit boards: Measurements and finite- element- simulations. / Weide-Zaage, Kirsten; Horaud, Walter; Frémont, Hélène.
    in: Microelectronics reliability, Jahrgang 45, Nr. 9-11, 09.2005, S. 1662-1667.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Simulation of mass flux divergence distributions for an evaluation of commercial test structures with tungsten-plugs. / Weide-Zaage, Kirsten; Hein, Verena.
    Proceedings of the 6th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Micro-Electronics and Micro-Systems - EuroSimE 2005. 2005. S. 353-358 1502827 (Proceedings of the 6th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Micro-Electronics and Micro-Systems - EuroSimE 2005; Band 2005).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2004


    How to study delamination in plastic encapsulated devices. / Frémont, Hélène; Delétage, Jean Yves; Weide-Zaage, Kirsten et al.
    in: Microelectronics reliability, Jahrgang 44, Nr. 9-11 SPEC. ISS., 09.2004, S. 1311-1316.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Effect of thermal gradients on the electromigration life-time in power electronics. / Nguyen, H. V.; Salm, C.; Krabbenborg, B. et al.
    2004 IEEE International Reliability Physics Symposium: Proceedings. Band 2004-January January. Aufl. 2004. S. 619-620 (IEEE International Reliability Physics Symposium Proceedings).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Effect of thermal gradients on the electromigration lifetime in power electronics. / Nguyen, H. V.; Salm, C.; Krabbenborg, B. et al.
    2004 IEEE International Reliability Physics Symposium. Proceedings. 2004. S. 619-620 (Annual Proceedings - Reliability Physics (Symposium)).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

    Void formation in a copper-via-structure depending on the stress free temperature and metallization geometry. / Weide-Zaage, Kirsten; Dalleau, David; Danto, Yves et al.
    Proceedings of the 5th International Conference on Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2004. Hrsg. / L.J. Ernst; G.Q. Zhang; P. Rodgers; O. Saint Leger. 2004. S. 367-372 (Proceedings of the 5th International Conference on Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, EuroSimE 2004).

    Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review


    2003


    Simulation of time depending void formation in copper, aluminum and tungsten plugged via structures. / Dalleau, David; Weide-Zaage, Kirsten; Danto, Yves.
    in: Microelectronics reliability, Jahrgang 43, Nr. 9-11, 09.2003, S. 1821-1826.

    Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review

    Static and dynamic analysis of failure locations and void formation in interconnects due to various migration mechanisms. / Weide-Zaage, Kirsten; Dalleau, David; Yu, Xiaoying.
    in: Materials Science in Semiconductor Processing, Jahrgang 6, Nr. 1-3, 02.2003, S. 85-92.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review


    2001


    Three-dimensional voids simulation in chip metallization structures: A contribution to reliability evaluation. / Dalleau, D.; Weide-Zaage, K.
    in: Microelectronics reliability, Jahrgang 41, Nr. 9-10, 09.2001, S. 1625-1630.

    Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

    Verifikation der layout getreuen FE-simulation eines MO-166 gehäuses mittels elektrischer messung und IR-untersuchung. / Weide-Zaage, K.; Keck, C.; Willemen, J.
    in: ITG-Fachbericht, Nr. 164, 2001, S. 219.

    Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review

    Vergleich industrieller entwicklungswerkzeuge für elektrothermische schaltungssimulation. / Willemen, J.; Soppa, W.; Pieper, K. W. et al.
    in: ITG-Fachbericht, Nr. 164, 2001, S. 143.

    Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review


    2000


    3-D time-depending electro- and thermomigration simulation of metallization structures. / Dalleau, D.; Weide-Zaage, K.
    in: Advanced Metallization Conference (AMC), 2000, S. 477-481.

    Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review


    1999


    Impact of FEM simulation on reliability improvement of packaging. / Weide, Kirsten.
    in: Microelectronics reliability, Jahrgang 39, Nr. 6-7, 1999, S. 1079-1088.

    Publikation: Beitrag in FachzeitschriftKonferenzaufsatz in FachzeitschriftForschungPeer-Review


  • Forschungsprojekte

    Systementwurf